JPH0346977B2 - - Google Patents

Info

Publication number
JPH0346977B2
JPH0346977B2 JP56192178A JP19217881A JPH0346977B2 JP H0346977 B2 JPH0346977 B2 JP H0346977B2 JP 56192178 A JP56192178 A JP 56192178A JP 19217881 A JP19217881 A JP 19217881A JP H0346977 B2 JPH0346977 B2 JP H0346977B2
Authority
JP
Japan
Prior art keywords
film
forming
insulating film
isolation insulating
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56192178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5893270A (ja
Inventor
Iwao Tokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP19217881A priority Critical patent/JPS5893270A/ja
Publication of JPS5893270A publication Critical patent/JPS5893270A/ja
Publication of JPH0346977B2 publication Critical patent/JPH0346977B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP19217881A 1981-11-30 1981-11-30 半導体装置の製造方法 Granted JPS5893270A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19217881A JPS5893270A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19217881A JPS5893270A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5893270A JPS5893270A (ja) 1983-06-02
JPH0346977B2 true JPH0346977B2 (en]) 1991-07-17

Family

ID=16286971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19217881A Granted JPS5893270A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5893270A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189264A (ja) * 1984-03-08 1985-09-26 Agency Of Ind Science & Technol 半導体装置及びその製造方法
JPS6231176A (ja) * 1985-08-02 1987-02-10 Sharp Corp 積層型半導体装置
JPS62145774A (ja) * 1985-12-20 1987-06-29 Agency Of Ind Science & Technol 半導体装置
JPH084126B2 (ja) * 1987-09-19 1996-01-17 富士通株式会社 半導体装置の製造方法
JP4746832B2 (ja) * 2003-09-12 2011-08-10 Ｎｅｃ液晶テクノロジー株式会社 パターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5249772A (en) * 1975-10-18 1977-04-21 Hitachi Ltd Process for production of semiconductor device

Also Published As

Publication number Publication date
JPS5893270A (ja) 1983-06-02

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